Multiple grid fabrication method

Metal working – Barrier layer or semiconductor device making – Barrier layer device making

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Details

29 2516, 29 2518, 228159, 228161, H01J 914

Patent

active

041931769

ABSTRACT:
A method of fabricating an improved multiple grid electrode having a plurality of discs by simultaneously forming a dimpled segment in a sandwich structure consisting of metallic discs separated by spacer material. The dimpled sandwich structure is then machined, forming a series of vanes on the dimpled portion by an appropriate method, such as electrical discharge. After machining, the spacer material is etched away, leaving only the vaned discs, forming grid electrodes.

REFERENCES:
patent: 3152939 (1964-10-01), Borneman et al.
patent: 3315330 (1967-04-01), Hisada

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