Multiple gas injection apparatus for LPCVD equipment

Details Multiple gas injection apparatus for LPCVD equipment Multiple gas injection apparatus for LPCVD equipment

1986-06-02

1988-07-12

Bueker, Richard

Coating apparatus

Gas or vapor deposition

118725, 118 50, C23C 1600

Patent

active

047562722

ABSTRACT:
A quick-release multiple gas injection pipe connector fitting for removable attachment to a gas reaction chamber having a plurality of gas injection passages. The fitting permits a number of gas inlet lines to be removed from or attached to a reaction chamber fixture in one operation without a separate removal or attachment step for each gas line. The fitting also facilitates a process where the reaction gases are preferably mixed only at the reaction site and not before.

REFERENCES:
patent: 4573431 (1986-03-01), Sarkozy
patent: 4592307 (1986-06-01), Jolly
Webster's Third International Unabridged Dictionary, G & C Merriam Co., Springfield, Mass., p. 1376.

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