Multiple filament enhanced ion source

Details Multiple filament enhanced ion source Multiple filament enhanced ion source

1990-10-10

1993-10-26

LaRoche, Eugene R.

Electric lamp and discharge devices: systems

Discharge device load with fluent material supply to the...

Electron or ion source

315 65, 31323141, 313236, 250423R, 250427, H01J 2702

Patent

active

052569470

ABSTRACT:
An improved ion source is provided with multiple filaments and wiring for selectively connecting various combinations of filaments to a current source. In one embodiment an additional filament is a spare filament which is connected to the current source when the primary filament burns out. This decreases down time due to filament replacement. In another embodiment, an additional filament operates simultaneously with a primary filament to provide a more homogenous electron cloud and to increase filament life.

REFERENCES:
patent: 4447732 (1984-05-01), Leung et al.
patent: 4527095 (1985-07-01), Herring
patent: 4661710 (1987-04-01), Verney et al.
patent: 4742232 (1988-05-01), Biddle et al.
patent: 4793961 (1988-12-01), Ehlers et al.
patent: 4886971 (1989-12-01), Matsumura et al.
patent: 5061879 (1991-10-01), Munoz et al.

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