Radiation imagery chemistry: process – composition – or product th – Registration or layout process other than color proofing
Patent
1996-10-07
1997-05-20
McPherson, John A.
Radiation imagery chemistry: process, composition, or product th
Registration or layout process other than color proofing
430394, 430312, G03F 900
Patent
active
056311125
ABSTRACT:
A method for photo-exposing a blanket conformal photosensitive layer upon a high step height topography substrate layer. There is first provided a high step height topography substrate layer having a blanket conformal photosensitive layer formed thereupon. The high step height topography substrate layer has a first region having a first step height separated from a third region having a third step height by a second region having a second step height. The second step height is intermediate to the first step height and the third step height. The blanket conformal photosensitive layer is photo-exposed to form a first pattern upon the first region and the second region through use of a first reticle and a first photo-exposure condition. The first photo-exposure condition provides a first depth of focus suitable for at least the first region. In a separate process step, the blanket conformal photosensitive layer is photo-exposed to form a second pattern upon the second region and the third region through use of a second reticle and a second photo-exposure condition. The second photo-exposure condition provides a second depth of focus suitable for at least the third region. The first pattern upon the second region and the second pattern upon the second region overlap.
REFERENCES:
patent: 4869999 (1989-09-01), Fukuda et al.
patent: 5001038 (1991-03-01), Dorinski et al.
patent: 5128738 (1992-07-01), Lee et al.
patent: 5242770 (1993-09-01), Chen et al.
patent: 5323049 (1994-06-01), Motonami
patent: 5498500 (1996-03-01), Bae
patent: 5532091 (1996-07-01), Mizutani
Lan Shih-Yin
Liu Bin
Tsai Ming-Horn
McPherson John A.
Saile George O.
Szecsy Alek P.
Vanguard International Semiconductor Corporation
LandOfFree
Multiple exposure method for photo-exposing photosensitive layer does not yet have a rating. At this time, there are no reviews or comments for this patent.
If you have personal experience with Multiple exposure method for photo-exposing photosensitive layer, we encourage you to share that experience with our LandOfFree.com community. Your opinion is very important and Multiple exposure method for photo-exposing photosensitive layer will most certainly appreciate the feedback.
Profile ID: LFUS-PAI-O-1722940