Patent
1977-05-18
1978-12-26
Envall, Jr., R. N.
H01J 37305
Patent
active
041317530
ABSTRACT:
Disclosed is a vapor source assembly comprising a means for supporting at least one material to be vaporized, a plurality of electron-beam guns for producing electron beams, and a deflecting means for producing a magnetic field to deflect each electron beam through an arcuate path from its electron-beam gun to the material to be vaporized. The deflecting means includes a plurality of pairs of pole pieces positioned such that a north pole piece and a south pole piece, are on opposite sides of each electron-beam gun, and a plurality of magnetic means including magnets for interconnecting the south pole piece of each successive electron-beam gun with the north pole piece of the next successive electron-beam gun so as to form a single magnetic circuit. In preferred embodiments, the electron-beam guns are positioned below the maximum level of material in a cluster of crucibles, and two long pole pieces extend on opposite sides of the crucibles, but no pole piece extends between adjacent crucibles. A magnetic means for sweeping the electron beams may also be included.
REFERENCES:
patent: 3270233 (1966-08-01), Dietrich
patent: 3655902 (1972-04-01), Firestone et al.
patent: 3710072 (1973-01-01), Shrader et al.
McLeod Paul S.
Tsujimoto Kazumi N.
Airco, Inc.
Bopp Edmund W.
Cassett Larry R.
Draegert David A.
Envall, Jr. R. N.
LandOfFree
Multiple electron-beam vapor source assembly does not yet have a rating. At this time, there are no reviews or comments for this patent.
If you have personal experience with Multiple electron-beam vapor source assembly, we encourage you to share that experience with our LandOfFree.com community. Your opinion is very important and Multiple electron-beam vapor source assembly will most certainly appreciate the feedback.
Profile ID: LFUS-PAI-O-1129578