Chemistry: electrical and wave energy – Apparatus – Coating – forming or etching by sputtering
Patent
1998-05-22
2000-03-28
Diamond, Alan
Chemistry: electrical and wave energy
Apparatus
Coating, forming or etching by sputtering
20429802, 20429804, 20429817, 20429841, 20429837, 335209, 335299, 335213, 335297, 335306, 335282, 118723FE, 118723FI, C14C 1435, H01F 500
Patent
active
060427078
ABSTRACT:
An electromagnet assembly magnetically orients a thin magnetic film deposited onto a surface of a substrate. The magnetic orientation can take place in a low-pressure processing environment such as during the deposition of the thin magnetic film or during a subsequent operation such as annealing. The electromagnet assembly includes a plate-shaped core located adjacent to the substrate and two or more electromagnetic coils that are wrapped in different directions around the core. Electrical currents conveyed through the electromagnetic coils are controlled for orienting a substantially uniaxial magnetic field throughout a range of angular positions in a plane of the substrate surface.
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Cheng Shiyuan
Davis Cecil J.
Heimanson Dorian
Moslehi Mehrdad M.
CVC Products Inc.
Diamond Alan
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