Multiple channel electron beam optical column lithography system

Details Multiple channel electron beam optical column lithography system Multiple channel electron beam optical column lithography system

1985-06-28

1987-09-15

Anderson, Bruce C.

Radiant energy

With charged particle beam deflection or focussing

Magnetic lens

250398, 2504922, G21K 108, H01J 314, H01J 326

Patent

active

046941789

ABSTRACT:
The invention provides an improved direct-write/read charged particle beam lithography/readout system employing multiple channel charged particle beam optical columns wherein a plurality of individually controlled, single deflector stage charged particle beam optical columns are operated in parallel to simultaneously write or read the same or complementary semiconductor device microcircuit patterns on a plurality of different target areas of a semiconductor target wafer whereby considerably increased thru-put of a microcircuit fabrication facility is achieved.

REFERENCES:
patent: 3491236 (1970-01-01), Newberry
patent: 4151422 (1979-04-01), Goto et al.
patent: 4200794 (1980-04-01), Newberry et al.
patent: 4213053 (1980-07-01), Pfeiffer
patent: 4390789 (1983-06-01), Smith et al.
patent: 4465934 (1984-08-01), Westerberg et al.

Affiliated with

Also associated with

Rating

Multiple channel electron beam optical column lithography system does not yet have a rating. At this time, there are no reviews or comments for this patent.

If you have personal experience with Multiple channel electron beam optical column lithography system, we encourage you to share that experience with our LandOfFree.com community. Your opinion is very important and Multiple channel electron beam optical column lithography system will most certainly appreciate the feedback.

Rate now

Comments { 0 }

Profile ID: LFUS-PAI-O-1386857