Multiple alternating phase shift technology for amplifying...

Details Multiple alternating phase shift technology for amplifying... Multiple alternating phase shift technology for amplifying...

2006-02-21

2006-02-21

Mohamedulla, Saleha R. (Department: 1756)

Radiation imagery chemistry: process, composition, or product th

Radiation modifying product or process of making

Radiation mask

Reexamination Certificate

active

07001695

ABSTRACT:
A method and apparatus for improving resolution in photolithography. The method includes steps of mapping a first phase onto a first mask, mapping a second phase onto a second mask, and mapping a trim onto the first mask or second mask (or both). Specifically, the first mask may include Phase1 mapped to 0/180 phase, and the second mask may include Phase2 and trim mapped to 0/180 phase. A set of masks consistent with the foregoing is provided.

REFERENCES:
patent: 5620816 (1997-04-01), Dao
patent: 5807649 (1998-09-01), Liebmann et al.
patent: 6251549 (2001-06-01), Levenson
patent: 6287732 (2001-09-01), Levenson
patent: 6479196 (2002-11-01), Levenson

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