Multiphoton photosensitization system

Details Multiphoton photosensitization system Multiphoton photosensitization system

2006-08-15

2006-08-15

Berman, Susan (Department: 1711)

Synthetic resins or natural rubbers -- part of the class 520 ser

Synthetic resins

Compositions to be polymerized by wave energy wherein said...

C522S025000, C522S026000, C522S028000, C522S150000, C522S162000, C430S328000, C430S329000, C430S338000, C430S343000

Reexamination Certificate

active

07091255

ABSTRACT:
A method of multiphoton photosensitizing a photoreactive composition comprises irradiating the composition with light sufficient to cause simultaneous absorption of at least two photons, thereby inducing at least one acid- or radical-initiated chemical reaction where the composition is exposed to the light. The composition comprises: (a) at least one reactive species that is capable of undergoing such reaction; and (b) at least one multi-component, multiphoton photoinitiator system.

REFERENCES:
patent: 3018262 (1962-01-01), Schroeder
patent: 3117099 (1964-01-01), Proops et al.
patent: 3635545 (1972-01-01), VanKerkhove et al.
patent: 3720921 (1973-03-01), Schools et al.
patent: 3729313 (1973-04-01), Smith
patent: 3741769 (1973-06-01), Smith
patent: 3758186 (1973-09-01), Brumm
patent: 3779778 (1973-12-01), Smith et al.
patent: 3806221 (1974-04-01), Kiemle
patent: 3808006 (1974-04-01), Smith
patent: 3954475 (1976-05-01), Bonham et al.
patent: 3987037 (1976-10-01), Bonham et al.
patent: 4041476 (1977-08-01), Swainson
patent: 4078229 (1978-03-01), Swanson et al.
patent: 4228861 (1980-10-01), Hart
patent: 4238840 (1980-12-01), Swainson
patent: 4250053 (1981-02-01), Smith
patent: 4279717 (1981-07-01), Eckberg et al.
patent: 4288861 (1981-09-01), Swainson et al.
patent: 4333165 (1982-06-01), Swainson et al.
patent: 4394403 (1983-07-01), Smith
patent: 4394433 (1983-07-01), Gatzke
patent: 4458345 (1984-07-01), Bjorklund et al.
patent: 4466080 (1984-08-01), Swainson et al.
patent: 4471470 (1984-09-01), Swainson et al.
patent: 4491628 (1985-01-01), Ito et al.
patent: 4496216 (1985-01-01), Cowan
patent: 4547037 (1985-10-01), Case
patent: 4588664 (1986-05-01), Fielding et al.
patent: 4642126 (1987-02-01), Zador et al.
patent: 4652274 (1987-03-01), Boettcher et al.
patent: 4666236 (1987-05-01), Mikami et al.
patent: 4775754 (1988-10-01), Vogel et al.
patent: 4859572 (1989-08-01), Farid et al.
patent: 4877717 (1989-10-01), Suzuki et al.
patent: 4963471 (1990-10-01), Trout et al.
patent: 5006746 (1991-04-01), Kasuga et al.
patent: 5034613 (1991-07-01), Denk et al.
patent: 5037917 (1991-08-01), Babb et al.
patent: 5145942 (1992-09-01), Hergenrother et al.
patent: 5159037 (1992-10-01), Clement et al.
patent: 5159038 (1992-10-01), Babb et al.
patent: 5225918 (1993-07-01), Taniguchi et al.
patent: 5235015 (1993-08-01), Ali et al.
patent: 5283777 (1994-02-01), Tanno et al.
patent: 5289407 (1994-02-01), Strickler et al.
patent: 5405733 (1995-04-01), Sirkin et al.
patent: 5422753 (1995-06-01), Harris
patent: 5446172 (1995-08-01), Crivello et al.
patent: 5478869 (1995-12-01), Takahashi et al.
patent: 5479273 (1995-12-01), Ramsbottom
patent: 5529813 (1996-06-01), Kobsa et al.
patent: 5545676 (1996-08-01), Palazzotto et al.
patent: 5665522 (1997-09-01), Vogel et al.
patent: 5703140 (1997-12-01), Kunita et al.
patent: 5747550 (1998-05-01), Nohr et al.
patent: 5750641 (1998-05-01), Ezzell et al.
patent: 5753346 (1998-05-01), Leir et al.
patent: 5759721 (1998-06-01), Dhal et al.
patent: 5759744 (1998-06-01), Brueck et al.
patent: 5770737 (1998-06-01), Reinhardt et al.
patent: 5847812 (1998-12-01), Ooki et al.
patent: 5854868 (1998-12-01), Yoshimura et al.
patent: 5856373 (1999-01-01), Kaisaki et al.
patent: 5859251 (1999-01-01), Reinhardt et al.
patent: 5864412 (1999-01-01), Wilde
patent: 5952152 (1999-09-01), Cunningham et al.
patent: 5998495 (1999-12-01), Oxman et al.
patent: 6005137 (1999-12-01), Moore et al.
patent: 6025406 (2000-02-01), Oxman et al.
patent: 6025938 (2000-02-01), Kathman et al.
patent: 6030266 (2000-02-01), Ida et al.
patent: 6043913 (2000-03-01), Lu et al.
patent: 6048911 (2000-04-01), Shustack et al.
patent: 6051366 (2000-04-01), Baumann et al.
patent: 6100405 (2000-08-01), Reinhardt et al.
patent: 6103454 (2000-08-01), Dhar et al.
patent: 6107011 (2000-08-01), Gelbart
patent: 6215095 (2001-04-01), Partanen et al.
patent: 6262423 (2001-07-01), Hell et al.
patent: 6267913 (2001-07-01), Marder et al.
patent: 6297910 (2001-10-01), Xuan et al.
patent: 6312876 (2001-11-01), Huang et al.
patent: 6316153 (2001-11-01), Goodman et al.
patent: 6322931 (2001-11-01), Cumpston et al.
patent: 6322933 (2001-11-01), Daiber et al.
patent: 6441356 (2002-08-01), Mandella et al.
patent: 6541591 (2003-04-01), Olson et al.
patent: 6608228 (2003-08-01), Cumpston et al.
patent: 6624915 (2003-09-01), Kirkpatrick et al.
patent: 6703188 (2004-03-01), Kagami et al.
patent: 6750266 (2004-06-01), Bentsen et al.
patent: 2002/0034693 (2002-03-01), Fukuda et al.
patent: 2004/0067431 (2004-04-01), Arney et al.
patent: 2005/0009175 (2005-01-01), Bergh et al.
patent: 41 42 327 (1993-06-01), None
patent: 42 19 376 (1993-12-01), None
patent: 196 53 413 (1998-06-01), None
patent: 62-097791 (1987-05-01), None
patent: WO 92/00185 (1992-01-01), None
patent: WO 97/27519 (1997-07-01), None
patent: WO 98/21521 (1998-05-01), None
patent: WO 99/23650 (1999-05-01), None
patent: WO 99/53242 (1999-10-01), None
patent: WO 99/54784 (1999-10-01), None
patent: WO 02/079691 (2002-10-01), None
R. D. Allen, G. M. Wallraff, W. D. Hinsberg, and L. L. Simpson inHigh Performance Acrylic Polymers for Chemically Amplified Photoresist Applications, J. Vac. Sci. Technol. B, 9, 3357 (1991).
C. Xu and W. W. Webb inJ. Opt. Soc. Am. B, 13, 481 (1996).
R. D Allen et al. inProc. SPIE2438, 474 (1995).
I. B. Berlman inHandbook of Fluorescence Spectra of Aromatic Molecules, Second Edition, pp. 24-27, Academic Press, New York (1971).
J. N. Demas and G. A. Crosby inJ. Phys. Chem. 75, 991-1024 (1971).
J. V. Morris, M. A. Mahoney, and J. R. Huber inJ. Phys. Chem. 80, 969-974 (1976).
Bull. Chem. Soc. Japan, 42, 2924-2930 (1969).
R. J. Cox,Photographic Sensitivity, Academic Press (1973), R.J. Cox, ed., pp. 241-263.
D. F. Eaton inAdvances in Photochemistry, B. Voman et al., vol. 13, pp. 427-488, (1986).
Beringer et al.,J. Am. Chem. Soc. 81, 342 (1959).
Makukha et al.,Two-Photon-Excitation Spatial Distribution for Cross Focused Gaussian Beams, Applied Optics, vol. 40, No. 23, pp. 3932-3936 (Aug. 10, 2001).
Bunning et al.Electronically Switchable Grating Formed Using Ultrafast Holographic Two-Photon-Induced Photopolymerization, Chem. Mater., 2000, 12 pp. 2842-2844.
Diamond et al.,Two-Photon Holography in 3-D Photoploymer Host-Guest Matrix, Optics Express, vol. 6, No. 3, Jan. 31, 2000, pp. 64-68.
Diamond et al.,Two-Photon Holography in 3-D Photopolymer Host-Guest Matrix: errata ,Optic Express, vol. 6, No. 4, Feb. 14, 2000, pp. 109-110.
Ashley et al.,Holographic Data Storage, IBM J. Res. Develop. vol. 44, No. 3, May 2000, pp. 341-368.
Belfield et al.,Near-IR Two-Photon Photoinitiated Polymerization Using a Fluorone/Amine Initiating System, J. Am. Chem. Soc., 2000, 122 pp. 1217-1218.
Campagnola et al.,3-Dimensional Submicron Polymcrization of Acrylamide By Multiphoton Excitation of Xanthene Dyes, Macromolecules, 2000, vol. 33, pp. 1511-1513.
Hong-Bo Sun et al.,Three-dimensional Photonic Crystal Structures Achieved With Two-Photon-Absorption Photopolymerization of Material, Applied Physics Letters, vol. 74, No. 6, Feb. 8, 1999, pp. 786-788.
Cumpston et. al.Two-Photon Polymerization Initiators For Three-Dimensional Optical Data Storage and Microfabrication, Nature, vol. 398, Mar. 4, 1999, pp. 51-54.
Joshi et al.,Three-dimensional Optical Circuitry Using Two-Photo-Assisted Polymerization, Applied Physics Letters, vol. 74, No. 2, Jan. 11, 1999, pp. 170-172.
Bunning et al.,Electrically Switchable Grating Formed Using Ultrafast Holographic Two-Photon-Induced Photopolymerization, Chem. Mater. 2000, vol. 12, pp. 2842-2844.
Kirkpatrick et al.Holographic Recording Using Two-Photon-Induced Photopolymerization, Appl. Phys. A, vol. 69, pp. 461-464, 1999.
Maruo s et al.,Movable Microstructures made by Two-Photon Three-Dimensional Microfabrication, 1999 International Symposium on Micromechatronics and Human Science, vol. 23, pp. 173-178 XP002191032.
Kuebler S M et al.,Three-Dimensional Microfabrication Using Two-Photon Activated Chemistry, SPIEvol. 3937, pp. 97-105, Jan. 27, 2000 XP008000209.
Cumpston B H et al.,New Photopolmers Based on Two-Photon Absorbing Chromophores and Applic

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