Multiphase printing for E-beam lithography

Details Multiphase printing for E-beam lithography Multiphase printing for E-beam lithography

1991-03-04

1992-04-07

Berman, Jack I.

Radiant energy

Irradiation of objects or material

Irradiation of semiconductor devices

250398, H01J 37302

Patent

active

051031019

ABSTRACT:
A method for a raster scan particle or light beam lithography system for writing in multiple passes interleaved in such a manner as to achieve a composite result nearly identical to normal single pass raster scan writing with overlapped spots. Multiple pass writing, achieved with little or no degradation or throughput or lithography quality, provides an ideal platform for implementation of known image averaging techniques to improve lithography quality. This technique is combined with the known writing technique of "Virtual Addressing" to improve resolution with little or no degradation of throughput.

REFERENCES:
patent: 4498010 (1985-02-01), Biechler et al.
patent: 4586141 (1986-04-01), Yasuda et al.

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