Multiphase mixing device with staged gas introduction

Details Multiphase mixing device with staged gas introduction Multiphase mixing device with staged gas introduction

2006-05-30

2006-05-30

Bhat, N. (Department: 1764)

Chemical apparatus and process disinfecting, deodorizing, preser

Chemical reactor

Including heat exchanger for reaction chamber or reactants...

C422S198000, C422S198000, C422S220000, C422S224000

Reexamination Certificate

active

07052654

ABSTRACT:
The present invention comprises a mixing system that provides improved mixing of quench gas and process fluids in a height constrained interbed space while not increasing pressure drop. In particular, the device improves the effectiveness of an existing mixing volume in mixing the gas phase of two-phase systems. The mixing system includes a horizontal collection tray, a mixing chamber positioned below the collection tray, at least one passageway extending through the collection tray into the mixing chamber, and a vapor slipstream passageway extending through the collection tray into the mixing chamber for directing a vapor slipstream from above the collection tray into the mixing chamber. The mixing chamber and the collection tray define a two-phase mixing volume. The passageway conducts fluid containing at least some vapor from above the collection tray into the mixing chamber. The mixing chamber preferably includes at least one outlet opening for the downward passage of fluid. The vapor slipstream passageway, optionally, comprises a plurality of inlets arranged to impart rotational movement to the vapor phase at a location within the mixing chamber where the vapor phase has substantially expended the kinetic energy of its initial entry into the mixing chamber. As a result of providing at least one additional passageway for a vapor slipstream, and optionally, including one or more baffles as described above, significant re-acceleration of the vapor phase is achieved in the mixing chamber resulting in improvements in mixing efficiency of both the vapor and liquid phases.

REFERENCES:
patent: 3787189 (1974-01-01), Muffat et al.
patent: 4836989 (1989-06-01), Aly et al.
patent: 4960571 (1990-10-01), Bhagat et al.
patent: 5152967 (1992-10-01), Rossetti et al.
patent: 5403560 (1995-04-01), Deshpande et al.
patent: 5462719 (1995-10-01), Pedersen et al.
patent: 5554346 (1996-09-01), Perry et al.
patent: 5567396 (1996-10-01), Perry et al.
patent: 5635145 (1997-06-01), Den Hartog et al.
patent: 5690896 (1997-11-01), Stangeland et al.
patent: 5837208 (1998-11-01), Grott et al.
patent: 5935413 (1999-08-01), Boyd et al.
patent: 6180068 (2001-01-01), Boyd et al.
patent: 6186658 (2001-02-01), Nishida et al.
patent: 2002/0172632 (2002-11-01), Chou
patent: 2004/0037759 (2004-02-01), VanVIlet et al.
patent: 0 462 753 (1991-12-01), None
patent: 0 472 335 (1992-02-01), None
patent: 0 663 236 (1995-07-01), None
patent: 0 716 881 (1996-06-01), None
Co-pending application entitled, “Improved Multiphase Mixing Device with Baffles.”

Affiliated with

Also associated with

Rating

Multiphase mixing device with staged gas introduction does not yet have a rating. At this time, there are no reviews or comments for this patent.

If you have personal experience with Multiphase mixing device with staged gas introduction, we encourage you to share that experience with our LandOfFree.com community. Your opinion is very important and Multiphase mixing device with staged gas introduction will most certainly appreciate the feedback.

Rate now

Comments { 0 }

Profile ID: LFUS-PAI-O-3622611