Radiation imagery chemistry: process – composition – or product th – Radiation modifying product or process of making – Radiation mask
Patent
1998-02-13
1999-10-05
Rosasco, S.
Radiation imagery chemistry: process, composition, or product th
Radiation modifying product or process of making
Radiation mask
G03F 900
Patent
active
059621745
ABSTRACT:
The present invention is a multi layer reflective mask, and a method of fabricating the same, wherein the mask comprises a planar substrate, and a plurality of polished optically reflective regions fabricated on the substrate in an alternating pattern such that the top surface of the reflective regions are substantially co-planar. Each region has a defined phase shift and reflectivity, such that the optical properties of each region are independent of the respective height/thickness of the reflective materials applied to the substrate. Thus, normal planarization procedures performed to the top surface of the reflective regions are sufficient to obtain the optical characteristics of the mask, instead of having to perform a controlled etching process on the substrate to establish specific thicknesses of the reflective materials for defining the desired optical characteristics.
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patent: 5582939 (1996-12-01), Pierrat
patent: 5686208 (1997-11-01), Le et al.
patent: 5686209 (1997-11-01), Iwamatsu et al.
patent: 5795684 (1998-08-01), Troccolo
Micro)n Technology, Inc.
Rosasco S.
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