Optical: systems and elements – Light interference – Produced by coating or lamina
Reexamination Certificate
2005-07-06
2009-08-04
Lavarias, Arnel C (Department: 2872)
Optical: systems and elements
Light interference
Produced by coating or lamina
C359S589000, C359S584000
Reexamination Certificate
active
07570428
ABSTRACT:
A multilayer minus filter for reflecting a light having a predetermined wavelength and transmitting a light having a wavelength longer than and shorter than the predetermined wavelength, includes a repetition layer such that a sum of an average value of optical thickness of a high refractive index layer and an average value of optical thickness of a low refractive index layer is substantially equal to a reflection wavelength λ0with respect to a vertically incident light, wherein, when a rate H/L between the optical thickness H of the high reflective index layer and the optical thickness L of the low reflective index layer in the repetition layer of the high refractive index layer and the low refractive index layer is larger than 0.5 and smaller than 2, a reflection band formed in the reflection wavelength λ0by the repetition layer is utilized.
REFERENCES:
patent: 5400174 (1995-03-01), Pagis et al.
patent: 2002/0154387 (2002-10-01), Mori et al.
patent: 05-215916 (1993-08-01), None
patent: 2001-123467 (2002-10-01), None
patent: 2002-319727 (2002-10-01), None
patent: 2002-018713 (2003-07-01), None
patent: 2003-215332 (2003-07-01), None
Kenyon & Kenyon LLP
Lavarias Arnel C
Olympus Corporation
LandOfFree
Multilayer minus filter and fluorescence microscope does not yet have a rating. At this time, there are no reviews or comments for this patent.
If you have personal experience with Multilayer minus filter and fluorescence microscope, we encourage you to share that experience with our LandOfFree.com community. Your opinion is very important and Multilayer minus filter and fluorescence microscope will most certainly appreciate the feedback.
Profile ID: LFUS-PAI-O-4117970