Radiation imagery chemistry: process – composition – or product th – Imaged product – Multilayer
Reexamination Certificate
2006-12-05
2006-12-05
Schilling, Richard L. (Department: 1752)
Radiation imagery chemistry: process, composition, or product th
Imaged product
Multilayer
C430S271100, C430S302000, C430S964000
Reexamination Certificate
active
07144661
ABSTRACT:
Positive-working imageable elements comprise a radiation absorbing compound and inner and outer layers on a substrate having a hydrophilic surface. The inner layer comprises a polymer that is removable using an alkaline developer and in which from about 1 to about 50 mol % of its recurring units are derived from one or more of the ethylenically unsaturated polymerizable monomers represented by the following Structure (I):in-line-formulae description="In-line Formulae" end="lead"?CH2═C(R1)C(═O)NR2(CR3R4)nOH (I)in-line-formulae description="In-line Formulae" end="tail"?wherein R1, R2, R3, and R4are independently hydrogen, lower alkyl, or phenyl, and n is 1 to 20. The imageable elements having improved resistance to development and printing chemicals and solvents.
REFERENCES:
patent: 5731127 (1998-03-01), Ishizuka et al.
patent: 6060217 (2000-05-01), Nguyen et al.
patent: 6143464 (2000-11-01), Kawauchi
patent: 6294311 (2001-09-01), Shimazu et al.
patent: 6352811 (2002-03-01), Patel et al.
patent: 6352812 (2002-03-01), Shimazu et al.
patent: 6358669 (2002-03-01), Savariar-Hauck et al.
patent: 6475692 (2002-11-01), Jarek et al.
patent: 6525152 (2003-02-01), Jarek
patent: 6593055 (2003-07-01), Shimazu et al.
patent: 6645689 (2003-11-01), Jarek
patent: 6893783 (2005-05-01), Kitson et al.
patent: 2002/0081522 (2002-06-01), Miyake et al.
patent: 2002/0160299 (2002-10-01), Asawa et al.
patent: 2003/0203312 (2003-10-01), Serikawa et al.
patent: 2004/0067432 (2004-04-01), Kitson et al.
patent: 2005/0037292 (2005-02-01), Kitson et al.
patent: 2005/0244749 (2005-11-01), Kitson et al.
patent: WO 2005/018934 (2005-03-01), None
JP Abstract 11-119419, Apr. 30, 1999, Ikuo.
JP Abstract 2000-330265, Nov. 30, 2000, Ikuo.
U.S. Appl. No. 11/018,335, filed Dec. 21, 2004, “Solvent Resistant Imageable Element” by Kitson and Ray.
U.S. Appl. No. 11/129,844, filed May 16, 2005, “Bakeable Multi-Layer Imageable Element” by Ray and Kitson.
Krebs Andrew
Ray Joanne
Ray Kevin B.
Sheriff Eugene L.
Eastman Kodak Company
Schilling Richard L.
Tucker J. Lanny
LandOfFree
Multilayer imageable element with improved chemical resistance does not yet have a rating. At this time, there are no reviews or comments for this patent.
If you have personal experience with Multilayer imageable element with improved chemical resistance, we encourage you to share that experience with our LandOfFree.com community. Your opinion is very important and Multilayer imageable element with improved chemical resistance will most certainly appreciate the feedback.
Profile ID: LFUS-PAI-O-3706013