X-ray or gamma ray systems or devices – Specific application – Diffraction – reflection – or scattering analysis
Patent
1994-06-10
1996-06-18
Wong, Don
X-ray or gamma ray systems or devices
Specific application
Diffraction, reflection, or scattering analysis
378 85, G21K 106
Patent
active
055286542
ABSTRACT:
A multilayer film for X-rays comprising two kinds of films having different refractive indices, deposited alternately, wherein one of said two kinds of films which has smaller refractive index consists of an alloy containing Co and Cr. The multilayer film is capable of being utilized as an optical element such as a reflection mirror or a reflection-type X-ray mask.
REFERENCES:
patent: 5216539 (1993-06-01), Boher et al.
patent: 5310603 (1994-05-01), Fukuda et al.
Fabrication and Evaluation of Cr-C Multilayer Mirrors for Soft X-Rays, M. Niibe et al., vol. 1720, pp. 208-216, 1992.
Journal of Applied Physics, Aug. 1, 1990, P. Ruterana et al., vol. 68, pp. 1033-1037, Aug. 1, 1990, "A Transmission Electron Microscopy Study of Low-Temperature Reaction at the Co-Si Interface."
Applied Optics, J. H. Underwood et al., vol. 20, No. 17, Sep. 1, 1981, "Layered Synthetic Microstructures as Bragg Diffractors for X-Rays and Extreme Ultraviolet: Theory and Predicted Performance."
Fukuda Yasuaki
Niibe Masahito
Canon Kabushiki Kaisha
Wong Don
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