Radiation imagery chemistry: process – composition – or product th – Diazo reproduction – process – composition – or product – Composition or product which contains radiation sensitive...
Patent
1982-09-29
1987-06-09
Bowers, Jr., Charles L.
Radiation imagery chemistry: process, composition, or product th
Diazo reproduction, process, composition, or product
Composition or product which contains radiation sensitive...
430259, 430262, 430263, 430270, 430273, G03C 154, G03C 190
Patent
active
046720200
ABSTRACT:
Dry-film, positive-acting photoresist layers are used in the formation of many articles such as circuit boards, printing plates and the like. Laminable monolayers of photoresist suffer from slow speeds, brittleness, and narrow latitude during development and exposure. The use of a thermoplastic, crosslinked or crosslinkable integral adhesive layer on the dry-film, positive-acting photoresist layer improves the properties and performance of the photoresist.
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Koelsch Peter M.
Vikesland John P.
Bowers Jr. Charles L.
Litman Mark A.
Minnesota Mining and Manufacturing Company
Sell Donald M.
Smith James A.
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