Multilayer dry-film positive-acting laminable photoresist with t

Details Multilayer dry-film positive-acting laminable photoresist with t Multilayer dry-film positive-acting laminable photoresist with t

1984-12-27

1986-02-18

Bowers, Jr., Charles L.

Radiation imagery chemistry: process, composition, or product th

Diazo reproduction, process, composition, or product

Composition or product which contains radiation sensitive...

430143, 430166, 430258, 430260, 430271, 430273, 430275, 430259, G03C 154, G03C 160, G03C 1495

Patent

active

045713740

ABSTRACT:
Dry-film, positive-acting photoresist layers are used in the formation of many articles such as circuit boards, printing plates and the like. Laminable monolayers of photoresist suffer from slow speeds, brittleness, and narrow latitude during development and exposure. The use of a laminable positive-acting photoresist integral adhesive layer on the dry-film, positive-acting photoresist layer improves the properties and performance of the photoresist.

REFERENCES:
patent: 3649283 (1972-03-01), Christensen et al.
patent: 4180604 (1979-12-01), Feng et al.
patent: 4191573 (1980-03-01), Toyama et al.
patent: 4217407 (1980-08-01), Watanabe et al.
patent: 4247616 (1981-01-01), Vikesland et al.
patent: 4260673 (1981-04-01), Krech
patent: 4352870 (1982-10-01), Howard et al.
patent: 4464458 (1984-08-01), Chow et al.
patent: 4504566 (1985-03-01), Dueber

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