Multilayer depth profile method

Chemistry: electrical and wave energy – Processes and products

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204434, G01N 2720

Patent

active

046295364

ABSTRACT:
Methods are provided for analyzing multilayer structures. The multilayer structure is electrolytically anodized at constant current through a plurality of layers of the structure over a predetermined surface area. During the anodization, the change of the anodization voltage or a time derivative thereof as a function of time is monitored as the anodization through the layers occurs to obtain data. The data may be analyzed in several ways to determine whether degradation of the multilayer structure has occurred, to determine the number of layers present in the multilayer structure and to determine the layer thickness of the multilayer structure.
The disclosed methods are accurate, inexpensive and rapid.

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