Multilayer coating for microelectronic devices

Details Multilayer coating for microelectronic devices Multilayer coating for microelectronic devices

1996-06-05

1998-07-14

Lusignan, Michael

Stock material or miscellaneous articles

Composite

Of silicon containing

427227, 427228, 427255, 427261, 4273762, 4273763, 428448, 428450, 428457, B32B 904, B32B 906

Patent

active

057801630

ABSTRACT:
A method of forming a protective covering on an electronic or microelectronic device to prevent inspection. A first silica-containing ceramic layer is applied to the surface of the device to planarize its surface. A second silicon carbide coating layer is applied to the surface of the first silica-containing ceramic layer to form a hermetic barrier. A third porous silica-containing ceramic layer is formed on the surface of the second silicon carbide coating layer. The third porous silica-containing ceramic layer is impregnated with an opaque material or filler. A fourth metal layer or metal pattern is applied over the third opaque porous silica-containing ceramic layer. The fourth metal layer or pattern is then coated with a fifth layer similar to the third opaque porous silica-containing ceramic layer.

REFERENCES:
patent: 3615272 (1971-10-01), Collins
patent: 4973526 (1990-11-01), Haluska
patent: 4999397 (1991-03-01), Weiss
patent: 5010159 (1991-04-01), Bank
patent: 5011706 (1991-04-01), Tarhay
patent: 5145723 (1992-09-01), Ballance
patent: 5380567 (1995-01-01), Haluska
patent: 5399441 (1995-03-01), Bearinger
patent: 5458912 (1995-10-01), Canilletti

Affiliated with

Also associated with

Rating

Multilayer coating for microelectronic devices does not yet have a rating. At this time, there are no reviews or comments for this patent.

If you have personal experience with Multilayer coating for microelectronic devices, we encourage you to share that experience with our LandOfFree.com community. Your opinion is very important and Multilayer coating for microelectronic devices will most certainly appreciate the feedback.

Rate now

Comments { 0 }

Profile ID: LFUS-PAI-O-1879982