Multichannel plate assembly for gas source molecular beam epitax

Details Multichannel plate assembly for gas source molecular beam epitax Multichannel plate assembly for gas source molecular beam epitax

1990-08-08

1993-02-23

Bueker, Richard

Coating apparatus

Gas or vapor deposition

118726, C23C 1600, C23C 1648

Patent

active

051886715

ABSTRACT:
A microchannel plate array assembly (10), comprising an array of microchannels in a microchannel plate (24), is provided in place of a conventional effusion cell to attain high and uniform fluxes localized in the substrate area for the growth of films thereon by gas source molecular beam epitaxy. Using this approach, an effective pressure at the substrate can be sustained which is as much as 100 times greater than the background pressure in the growth chamber.

REFERENCES:
patent: 3996025 (1976-12-01), Gulden
patent: 4774416 (1988-09-01), Askary
patent: 4792378 (1988-12-01), Rose
Patent Abstracts of Japan, vol. 9, No. 218 (C-301) (1941) Sep. 5, 1985 & JP-A-60081 093 (Nippon Shinku Gijutsu K.K.), May 9, 1985.
Patent Abstracts of Japan, vol. 11, No. 300 (C-449) (2747) Sep. 29, 1987 & JP-A-62 091 496 (NEC Corp.) Apr. 25, 1987.
Patent Abstracts of Japan, vol. 10, No. 214 (C-362) (2270), Jul. 25, 1986 & JP-A-61 053 197 (Matsushita Electric Ind. Co.) Mar. 17, 1986.
Patent Abstracts of Japan, vol. 13, No. 101 (C-574) (3449), Mar. 9, 1989 & JP-A-63-277 591 (NEC Corp.) Nov. 15, 1988.

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