Multichannel drainage system

Cleaning and liquid contact with solids – Processes – Including regeneration – purification – recovery or separation...

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Details

134 26, 134 32, 134 96, 233 18, 233 32, 427240, B08B 704

Patent

active

039501841

ABSTRACT:
Disclosed is a multichannel drainage system for separately draining the centrifugally broadcast residue of different liquids sequentially dispensed on the top surface of a semiconductor wafer spun on a spindle at a work station. The multichannel drainage system includes a cup assembly mounted on a cup plate which is raised and lowered by elevator apparatus. The cup assembly has a lower drainage cup forming an annular channel and a first outlet communicating with the channel. An upper drainage cup, stacked atop the lower cup, forms a second annular channel communicating with a second outlet. The elevator apparatus raises or lowers the cup plate under the action of a cam. The cam has a three-stage profile, with each stage corresponding to a stationary position of the cup assembly relative the wafer. In the home position for loading and unloading the wafer, the cup assembly is below the wafer. In a second position, the spun wafer is disposed within the upper cup of the assembly so that the centrifugally broadcast residue of a first liquid applied to the wafer is received by the upper cup and drained through the first outlet. In the third position, the spun wafer is disposed within the lower cup of the assembly so that the centrifugally broadcast residue of a second liquid applied to the wafer is received by the lower cup and drained through the second outlet.

REFERENCES:
patent: 1981453 (1934-11-01), Hyde
patent: 3041225 (1962-06-01), Emeis
patent: 3489608 (1970-01-01), Jacobs et al.

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