Multi-zone shower head for drying single semiconductor...

Details Multi-zone shower head for drying single semiconductor... Multi-zone shower head for drying single semiconductor...

2007-06-12

2007-06-12

Gravini, S. (Department: 3749)

Drying and gas or vapor contact with solids

Apparatus

With apparatus using centrifugal force

C034S090000, C118S073000, C118S608000, C427S240000

Reexamination Certificate

active

11032852

ABSTRACT:
A shower head processes a wafer with a plate having a plurality of nozzles positioned thereon, each of the nozzles assigned to one of a plurality of processing zones for the wafer; and a manifold assembly coupled to each of the nozzles to control one or more of the nozzles as a group in each processing zone.

REFERENCES:
patent: 4510176 (1985-04-01), Cuthbert et al.
patent: 5368054 (1994-11-01), Koretsky et al.
patent: 5762709 (1998-06-01), Sugimoto et al.
patent: 5951373 (1999-09-01), Shendon et al.
patent: 5954878 (1999-09-01), Mandal et al.
patent: 6164297 (2000-12-01), Kamikawa
patent: 6248168 (2001-06-01), Takeshita et al.
patent: 6590344 (2003-07-01), Tao et al.
patent: 6632292 (2003-10-01), Aegerter et al.
patent: 6830619 (2004-12-01), Shirley
patent: 2002/0127334 (2002-09-01), Gurer et al.

Affiliated with

Also associated with

Rating

Multi-zone shower head for drying single semiconductor... does not yet have a rating. At this time, there are no reviews or comments for this patent.

If you have personal experience with Multi-zone shower head for drying single semiconductor..., we encourage you to share that experience with our LandOfFree.com community. Your opinion is very important and Multi-zone shower head for drying single semiconductor... will most certainly appreciate the feedback.

Rate now

Comments { 0 }

Profile ID: LFUS-PAI-O-3887122