Multi-zone planar heater assembly and method of operation

Electric heating – Heating devices – Combined with container – enclosure – or support for material...

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219390, 219464, F27B 514

Patent

active

050597701

ABSTRACT:
A heater assembly and method of operation for use in processing of a substrate such as a semiconductor wafer, for example in a chemical vapor deposition (CVD) reactor chamber, the heater assembly including a dielectric heater base, radially spaced apart and circumferentially extending heater element segments being arranged on the heater base, operation of the plurality of heater elements being independently regulated, a heater shroud being arranged in spaced apart relation over the heater elements while supporting the substrate for maintaining a blanket of inert gas between the heater elements and the heater shroud. Inert gas is preferably introduced through a central opening in the heater base and is selectively regulated for facilitating processing of the substrate.

REFERENCES:
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patent: 3536892 (1970-10-01), Walther
patent: 3836751 (1974-09-01), Anderson
patent: 3842794 (1974-10-01), Ing
patent: 4002883 (1977-01-01), Hurko
patent: 4101759 (1978-07-01), Anthony
patent: 4292276 (1981-09-01), Enomoto
patent: 4503807 (1985-03-01), Nakayama
patent: 4545327 (1985-10-01), Campbell
patent: 4859832 (1989-08-01), Uehara

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