Coating apparatus – Gas or vapor deposition – Multizone chamber
Patent
1996-07-11
1999-11-02
Beck, Shrive
Coating apparatus
Gas or vapor deposition
Multizone chamber
118723R, 118723MP, 118723E, 4272481, 4272551, 427569, C23C 1600
Patent
active
059762616
ABSTRACT:
A method and apparatus for multi-zone injection apparatus of multiple process gases onto a work piece during manufacture. The multi-zone injection apparatus uses a gas injection plate with multiple injection zones to deliver the multiple process gases into the chamber for deposition onto the work piece (for example, a silicon wafer). The gas showerhead separates the multiple process in a manner that avoids premixing the process gases, thereby minimizing gas-phase nucleation and particulate generation. The showerhead also allows real-time independent control over the gas flow rates in N channels to achieve deposition uniformity. Different gases can be configured in adjacent channels to provide M zones of multi-gas radial control.
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Kermani Ahmad
Lee Yong Jin
Moslehi Mehrdad M.
Beck Shrive
Chen Bret
CVC Products Inc.
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