Multi wavelength mask for multi layer printing on a process...

Details Multi wavelength mask for multi layer printing on a process... Multi wavelength mask for multi layer printing on a process...

2004-09-29

2009-06-23

Huff, Mark F (Department: 1795)

Radiation imagery chemistry: process, composition, or product th

Radiation modifying product or process of making

Radiation mask

Reexamination Certificate

active

07550236

ABSTRACT:
A mask for exposing a first layer and a second layer on a process substrate, where the first and second layers are two separate layers of an integrated circuit. The mask includes a mask substrate that is substantially completely transmissive to a first wavelength of light and a second wavelength of light. A layer of a first material is disposed on the mask substrate, where the first material is substantially opaque to the first wavelength of light. The layer of the first material is patterned for the first layer. A layer of a second material is disposed on the mask substrate, where the second material is substantially opaque to the second wavelength of light. The layer of the second material is patterned for the second layer, where the layer of the first material and the layer of the second material are aligned on the mask substrate for proper alignment of the first and second layers on the process substrate.

REFERENCES:
patent: 4686162 (1987-08-01), Stangl et al.
patent: 5422205 (1995-06-01), Inoue et al.
patent: 5501926 (1996-03-01), Cheng et al.
patent: 5861226 (1999-01-01), Horne et al.
patent: 2003/0205657 (2003-11-01), Voisin
patent: 2004/0091791 (2004-05-01), Barber

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