Data processing: measuring – calibrating – or testing – Calibration or correction system
Reexamination Certificate
2011-06-21
2011-06-21
Khuu, Cindy Hien-Dieu (Department: 2857)
Data processing: measuring, calibrating, or testing
Calibration or correction system
Reexamination Certificate
active
07966142
ABSTRACT:
A method for assessing metrology tool accuracy is described. Multi-variable regression is used to define the accuracy of a metrology tool such that the interaction between different measurement parameters is taken into account. A metrology tool under test (MTUT) and a reference metrology tool (RMT) are used to measure a set of test profiles. The MTUT measures the test profiles to generate a MTUT data set for a first measurement parameter. The RMT measures the test profiles to generate RMT data sets for the first measurement parameter, and at least a second measurement parameter. Multi-variable regression is then performed to generate a best-fit plane for the data sets. The coefficient of determination (R2value) represents the accuracy index of the MTUT.
REFERENCES:
patent: 6746882 (2004-06-01), Stirton et al.
patent: 7221989 (2007-05-01), Prager et al.
patent: 7588949 (2009-09-01), Vuong et al.
patent: 2005/0197772 (2005-09-01), Archie et al.
patent: 2007/0192049 (2007-08-01), Archie et al.
patent: 2007/0239383 (2007-10-01), Funk et al.
patent: 2008/0151268 (2008-06-01), Archie et al.
patent: 2009/0031261 (2009-01-01), Smith et al.
patent: 2009/0157343 (2009-06-01), Kaushal et al.
Goh Jasper
Zhou Mei Sheng
Zhou Wen Zhan
Zou Zheng
Globalfoundries Singapore Pte. Ltd.
Horizon IP Pte. Ltd.
Khuu Cindy Hien-Dieu
LandOfFree
Multi-variable regression for metrology does not yet have a rating. At this time, there are no reviews or comments for this patent.
If you have personal experience with Multi-variable regression for metrology, we encourage you to share that experience with our LandOfFree.com community. Your opinion is very important and Multi-variable regression for metrology will most certainly appreciate the feedback.
Profile ID: LFUS-PAI-O-2705569