Abrading – Abrading process – Glass or stone abrading
Reexamination Certificate
2005-12-06
2005-12-06
Wilson, Lee D. (Department: 3723)
Abrading
Abrading process
Glass or stone abrading
C451S036000, C451S054000, C451S065000, C051S308000, C051S309000, C438S692000, C438S693000, C252S079100
Reexamination Certificate
active
06971945
ABSTRACT:
The present invention provides a multi-step aqueous composition useful for polishing a tantalum barrier material and copper from a semiconductor wafer, comprising by weight percent 0.1 to 30 oxidizer, 0.01 to 3 inorganic salt or acid, 0.01 to 4 inhibitor, 0.1 to 30 abrasive, 0 to 15 complexing agent and balance water, wherein the aqueous composition has a pH between 1.5 to 6.
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Liu Zhendong
Quanci John
Schmidt Robert E.
Thomas Terence M.
Oh Edwin
Ojini Anthony
Rohm and Haas Electronic Materials CMP Holdings Inc.
Wilson Lee D.
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