Multi-step phase shift mask and methods for fabrication thereof

Details Multi-step phase shift mask and methods for fabrication thereof Multi-step phase shift mask and methods for fabrication thereof

2006-11-14

2006-11-14

Rosasco, S. (Department: 1756)

Radiation imagery chemistry: process, composition, or product th

Radiation modifying product or process of making

Radiation mask

C430S323000

Reexamination Certificate

active

07135257

ABSTRACT:
A phase shift mask comprises a transparent substrate having a patterned opaque material layer formed thereupon to form a non-transmissive region of the transparent substrate and an adjoining transmissive region of the transparent substrate. A pit is formed within the transmissive region of the transparent substrate. The pit has a stepped sidewall such as to provide the phase shift mask with enhanced optical performance. The phase shift mask may be fabricated employing a self aligned method.

REFERENCES:
patent: 5932378 (1999-08-01), Lee

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