Chemistry of inorganic compounds – Modifying or removing component of normally gaseous mixture – Nitrogen or nitrogenous component
Reexamination Certificate
2007-04-03
2007-04-03
Johnson, Edward M. (Department: 1754)
Chemistry of inorganic compounds
Modifying or removing component of normally gaseous mixture
Nitrogen or nitrogenous component
Reexamination Certificate
active
10725057
ABSTRACT:
A selective catalytic reduction apparatus has at least first and last catalyst layers in series for reducing nitrogen oxides in a flue gas, at least one interstage heat exchanger located after the first layer and before the last layer, that lowers flue gas temperature, and that acts as a mixing body to lower the standard deviation of the NH3/NO ratio entering catalyst layers after the first catalyst layer, thus providing better consumption of both ammonia and NOx in the reactor than would be achieved in the absence of the at least one interstage heat exchanger.
REFERENCES:
patent: 4880378 (1989-11-01), Hums
patent: 4889698 (1989-12-01), Moller et al.
patent: 5233934 (1993-08-01), Krigmont et al.
patent: 6077491 (2000-06-01), Cooper et al.
patent: 6117405 (2000-09-01), Frey et al.
patent: 6136283 (2000-10-01), Stern
patent: 6706246 (2004-03-01), Hopkins et al.
patent: 6743404 (2004-06-01), Schumacher et al.
“Ljungstrom air Preheater Fouling Due to SCR Amonia Slip”, by W. Counterman et al., presented to the 1999 EPRI Workshop on SCR, Orlando, FL, Mar. 1999.
“Enhance Ammonia Distribution for Maximum SCR Performance”, by Ralf Sigling, Cindy Khalaf, Edward Healy, Institute of Clean Air Companies, Forum 2003, Nashville, TN, Oct. 14-15, 2003.
Carpenter Robert K.
Johnson Edward M.
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