Multi-spot illumination and collection optics for highly...

Details Multi-spot illumination and collection optics for highly... Multi-spot illumination and collection optics for highly...

2005-06-22

2008-03-18

Pham, Hoa Q. (Department: 2886)

Optics: measuring and testing

Inspection of flaws or impurities

Surface condition

C356S237500

Reexamination Certificate

active

07345752

ABSTRACT:
Multi-spot illumination and collection optics for highly tilted wafer planes are provided. One system configured to collect and detect light scattered from a wafer includes a set of optical elements configured to collect light scattered from spatially separated spots formed on a wafer plane at an oblique angle of incidence and to focus the light to corresponding spatially separated positions in an image plane. This system also includes a detection subsystem configured to separately detect the light focused to the spatially separated positions in the image plane.

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U.S. Appl. No. 11/158,441, filed Jun. 22, 2005, Kadkly et al.

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