Multi-source reactive deposition process for the preparation of

Details Multi-source reactive deposition process for the preparation of Multi-source reactive deposition process for the preparation of

1994-02-14

1996-04-09

Bell, Janyce

Coating processes

Electrical product produced

Fluorescent or phosphorescent base coating

427 69, 4272481, 4272552, B05D 506

Patent

active

055059864

ABSTRACT:
A multi-source reactive deposition process for preparing a phosphor layer for an AC TFEL device having the chemical formula M.sup.II M.sup.III.sub.2 X.sub.4 :RE, where M.sup.II is a group II metal taken from the group magnesium, calcium, strontium and barium, M.sup.III is a group III metal taken from the group aluminum, gallium and indium, X is taken from the group sulfur and selenium, and RE comprises a rare earth activator dopant taken from the group cerium and europium is disclosed. The phosphor film is formed in crystalline form on a substrate heated to a temperature between 400.degree. and 800.degree. C. by depositing more than one deposition source chemical where at least one of the deposition source chemicals of the group II metal or the group III metal is a compound.

REFERENCES:
Preparation of Eu-and Eu-Cl.sub.3 -Doped CaS Based Thin Film Electroluminescent Devices, from Acta Polytechnia Scandinavica, Applied Physics Series 170 (1990), p. 227.
Multi-Source Deposition Method for ZnS and SrS Thin-Film Electroluminescent Devices, from Proceeding of 4th Int. Works on Electroluminescence 1988; published in Springer Proceedings in Physics, vol. 38 "Electroluminescence," p. 180, 1989.

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