Semiconductor device manufacturing: process – Having magnetic or ferroelectric component
Reexamination Certificate
2006-07-04
2006-07-04
Blum, David S. (Department: 2813)
Semiconductor device manufacturing: process
Having magnetic or ferroelectric component
C438S054000, C438S385000
Reexamination Certificate
active
07071008
ABSTRACT:
A multi-resistive state material that uses dopants is provided. A multi-resistive state material can be used in a memory cell to store information. However, a multi-resistive state material may not have electrical properties that are appropriate for a memory device. Intentionally doping a multi-resistive state material to modify the electrical properties can, therefore, be desirable.
REFERENCES:
patent: 6204139 (2001-03-01), Liu et al.
Basun, S. A. et al., “Photoinduced Phenomena in Sr1−xCAxTiO2, 0 ≦ × ≦ 0.12”, Ferroelectrics, vol. 183, 1996,255-264.
Beck, A. et al., “Reproducible switching effect in thin oxide films for memory applications”, Applied Physics Letters, vol. 77, No. 1, Jul. 3, 2000,139-141.
Gerstner E.G. et al.,Nonvolatile memory effects in nitrogen doped tetrahedral amorphous carbon thin films, Journal of Applied Physics, vol. 84, No. 10, Nov. 15, 1998, 5647-5651.
Koidl, P. et al., “Photochromism in Ni-doped SrTiO3”, Physical Review B, vol. 14, No. 7, Oct. 1, 1976, 2703-2708.
Rossel, C. et al., “Electrical current distribution across a metal-insulator-metal structure during bistable switching”, Journal of Applied Physics, vol. 90, No. 6, Sep. 15, 2001, 2892-2898.
Watanabe, Y. et al., “Current-driven insulator-conductor transition and nonvolatile memory in chromium-doped SrTiO3single crystals”, Applied Physics Letters, vol. 78, No. 23, Jun. 4, 2001, 3738-3740.
Liu, S.Q., et al., “Electric-pulse-induced reversible resistance change effect in magnetoresistive films”, Applied Physics Letters, vol. 76, No. 19, May 8, 2000, 2749-2651.
Liu, S.Q., et al., “A New Concept For Non-Volatile Memory: Electric-Pulse Induced Reversible Resistance Change Effect In Magnetoresistive Films”, Space Vacuum Epitaxy Center, University of Huston, Huston TX, 7 Pages.
Chevallier Christophe J.
Hsia Steve Kuo-Ren
Kinney Wayne
Longcor Steven W.
Rinerson Darrell
Blum David S.
Unity Semiconductor Corporation
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