Multi-port chemical dispense

Details Multi-port chemical dispense Multi-port chemical dispense

2005-05-17

2005-05-17

Lamb, Brenda A. (Department: 1734)

Coating apparatus

With means to centrifuge work

C118S712000

Reexamination Certificate

active

06893504

ABSTRACT:
A method and apparatus for applying conservative amounts of a fluid to coat a silicon wafer surface. The surface is rotated and the fluid is applied to the surface through multiple application ports. Centrifugal forces spread the fluid across the wafer surface.

REFERENCES:
patent: 5393624 (1995-02-01), Ushijima
patent: 5646071 (1997-07-01), Lin
patent: 5772764 (1998-06-01), Akimoto

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