Abrading – Abrading process – Combined abrading
Reexamination Certificate
2006-10-24
2006-10-24
Nguyen, Dung Van (Department: 3723)
Abrading
Abrading process
Combined abrading
C451S060000, C451S041000
Reexamination Certificate
active
07125321
ABSTRACT:
A multi-platen, multi-slurry chemical mechanical polishing method comprises providing a substrate having a surface that includes at least one nitride structure and an oxide layer atop the nitride structure, performing a first CMP process on the substrate using a first platen with a silica based slurry to remove a bulk portion of the oxide layer without exposing the nitride structure, performing a second CMP process on the substrate using a second platen with a ceria based slurry to remove a residual portion of the oxide layer and to expose at least a portion of the nitride structure, and performing a third CMP process on the substrate using the first platen with a silica based slurry to remove at least one defect caused by the ceria based slurry.
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Ding Gary
Moinpour Mansour
Prince Matthew J
Tambwe Francis M
Engineer Rahul D.
Intel Corporation
Nguyen Dung Van
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