Multi-photon reactive compositions with inorganic particles...

Details Multi-photon reactive compositions with inorganic particles... Multi-photon reactive compositions with inorganic particles...

2007-09-04

2007-09-04

Berman, Susan (Department: 1711)

Synthetic resins or natural rubbers -- part of the class 520 ser

Synthetic resins

Compositions to be polymerized by wave energy wherein said...

C522S026000, C522S081000, C522S083000

Reexamination Certificate

active

10262927

ABSTRACT:
A multi-photon reactive composition including: (a) at least one reactive species; and (b) multi-photon photoinitiator system; and (c) a plurality of substantially inorganic particles, wherein the particles have an average particle size of less than about 10 microns in diameter.

REFERENCES:
patent: 2801185 (1957-07-01), Iler
patent: 3018262 (1962-01-01), Schroeder
patent: 3117099 (1964-01-01), Proops et al.
patent: 3502520 (1970-03-01), Schwartz
patent: 3729313 (1973-04-01), Smith
patent: 3741769 (1973-06-01), Smith
patent: 3808006 (1974-04-01), Smith
patent: 4250053 (1981-02-01), Smith
patent: 4279717 (1981-07-01), Eckberg et al.
patent: 4394403 (1983-07-01), Smith
patent: 4491628 (1985-01-01), Ito et al.
patent: 4522958 (1985-06-01), Das et al.
patent: 4642126 (1987-02-01), Zador et al.
patent: 4652274 (1987-03-01), Boettcher et al.
patent: 4859572 (1989-08-01), Farid et al.
patent: 4963471 (1990-10-01), Trout et al.
patent: 4970135 (1990-11-01), Kushi et al.
patent: 5032478 (1991-07-01), Nebe et al.
patent: 5032490 (1991-07-01), Nebe et al.
patent: 5047313 (1991-09-01), Nebe et al.
patent: 5235015 (1993-08-01), Ali et al.
patent: 5307438 (1994-04-01), Bilkadi et al.
patent: 5436279 (1995-07-01), Grundke et al.
patent: 5496682 (1996-03-01), Quadir et al.
patent: 5545676 (1996-08-01), Palazzotto et al.
patent: 5648407 (1997-07-01), Goetz et al.
patent: 5753346 (1998-05-01), Leir et al.
patent: 5770737 (1998-06-01), Reinhardt et al.
patent: 5856373 (1999-01-01), Kaisaki et al.
patent: 5859251 (1999-01-01), Reinhardt et al.
patent: 5998495 (1999-12-01), Oxman et al.
patent: 6025406 (2000-02-01), Oxman et al.
patent: 6100405 (2000-08-01), Reinhardt et al.
patent: 6267913 (2001-07-01), Marder et al.
patent: 6291145 (2001-09-01), Kokubo et al.
patent: 6316153 (2001-11-01), Goodman et al.
patent: 6455103 (2002-09-01), Mennig et al.
patent: 6512606 (2003-01-01), Lipson et al.
patent: 6593392 (2003-07-01), Wang
patent: 6624915 (2003-09-01), Kirkpatrick et al.
patent: 6656990 (2003-12-01), Shustack et al.
patent: 6682872 (2004-01-01), Sachdev et al.
patent: 6750266 (2004-06-01), Bentsen et al.
patent: 6852766 (2005-02-01), DeVoe
patent: 7005229 (2006-02-01), Nirmal et al.
patent: 7008749 (2006-03-01), Gonsalves
patent: 7026103 (2006-04-01), DeVoe et al.
patent: 7060419 (2006-06-01), Bentsen et al.
patent: 2002/0001763 (2002-01-01), Yasuno et al.
patent: 2003/0019517 (2003-01-01), McFarland
patent: 2003/0139484 (2003-07-01), Bentsen et al.
patent: 2003/0155667 (2003-08-01), Devoe et al.
patent: 2004/0067431 (2004-04-01), Arney et al.
patent: 2004/0067433 (2004-04-01), Nirmal et al.
patent: 2004/0067450 (2004-04-01), Leatherdale et al.
patent: 2004/0067451 (2004-04-01), DeVoe et al.
patent: 2004/0079195 (2004-04-01), Perry et al.
patent: 2005/0054744 (2005-03-01), DeVoe
patent: 0 432 907 (1991-06-01), None
patent: 0 977 212 (2000-02-01), None
patent: WO98/21521 (1998-05-01), None
patent: WO99/53242 (1999-10-01), None
patent: WO 00/73241 (2000-12-01), None
patent: WO 01/96409 (2001-12-01), None
patent: WO 01/96452 (2001-12-01), None
patent: WO 01/96915 (2001-12-01), None
patent: WO 01/96917 (2001-12-01), None
patent: WO 01/96952 (2001-12-01), None
patent: WO 01/96958 (2001-12-01), None
patent: WO 01/96959 (2001-12-01), None
patent: WO 01/96961 (2001-12-01), None
patent: WO 01/96962 (2001-12-01), None
patent: WO 02/079691 (2002-10-01), None
R. D. Allen, G. M. Wallraff, W. D. Hinsberg, and L. L. Simpson in “High Performance Acrylic Polymers for Chemically Amplified Photoresist Applications,” J. Vac. Sci. Technol. B, 9, 3357 (1991).
R. D Allen et al. in Proc. SPIE 2438, 474-477 (1995).
C. Xu and W. W. Webb in J. Opt. Soc. Am. B, 13, 481-491(1996).
I. B. Berlman inHandbook of Fluorescence Spectra of Aromatic Molecules, Second Edition, pp. 24-27, Academic Press, New York (1971).
J. N. Demas and G. A. Crosby in J. Phys. Chem. 75, 991-1024 (1971).
J. V. Morris, M. A. Mahoney, and J. R. Huber in J. Phys. Chem. 80, 969-974 (1976).
Beringer et al., J. Am. Chem. Soc. 81, 342-351 (1959).
Bull. Chem. Soc. Japan, 42, 2924-2930 (1969).
R. J. Cox,Photographic Sensitivity, Chapter 15, Academic Press (1973).
D. F. Eaton “Advances in Photochemistry”, edited by B. Voman et al., vol. 13, pp. 427-488, John Wiley and Sons, New York (1986).
R. A. Andrievsky, “State-of-the-art and perspective in the field of particulate nanostructured materials,” J. Mater Sci. Technol. 14, 97 (1998).
L.L. Beecroft et al., “Nanocomposite Materials for Optical Applications” Chem. Mater. 1997, pp. 1302-1317.
Belfield et al. “Multiphoton-absorbing organic Materials for Microfabrication, emerging optical applications and non-destructive three-dimensional imaging” J.Phys. Org. Chem. 2000, 13: pp. 837-849.
MEMES-vol. 2, Micro-Electro-Mechanical Systems-2000 “Optically-Driven Microstructures Fabricated by Two-Photon Microstereolithography”, pp. 695-699.
Macromolecules, vol. 33, No. 16, 2000, “Communication to the Editor”, pp. 5751-5753.
Stellacci et al., Adv. Mater. vol. 14, No. 3, “Laser and Electron-Beam Induced Growth of Nanoparticles for 2D and 3D Metal Patterning” pp. 194-198.
U.S. Appl. No. 10/033507, filed Dec. 28, 2001 Multiphoton Photosensitization System.
Cumpston et al., Two-Photon Polymerization Initiators for Three-Dimensional Optical Data Storage and Microfabrication,Nature, vol. 398, Mar. 4, 1999, pp. 51-54, XP002270322.
Stellacci et al., One- and Two-Photon Induced Growth of Ligand Coated Nanoparticles for 2 & 3D Metal Patterning,Proc. SPIE, vol. 4809, Jul. 9, 2002, pp. 62-68, XP002270320.
Wu et al., Two-Photon Photographic Production of Three-Dimensional Metallic Structures Within a Dielectric Matrix,Advanced Materials, vol. 12, No. 19, Oct. 2, 2000, pp. 1438-1441, XP002270323.
Zhou et al., An Efficient Two-Photon-Generated Photoacid Applied to Positive-Tone 3D Microfabrication,Science, vol. 296, May 10, 2002, pp. 1106-1109, XP002270321.
Lakowicz et al, “Emission Spectral Properties of Cadmium Sulfide Nanoparticles with Multiphoton Excitation”, J. Phys. Chem. B. 106. 5365-5370, 2002 XP-002316823.
Stellacci et al., Adv. Mater. vol. 14, No. 3, “Laser and Electron-Beam Induced Growth of Nanoparticles for 2D and 3D Metal Patterning” pp. 194-198, Feb. 2002.

Affiliated with

Also associated with

Rating

Multi-photon reactive compositions with inorganic particles... does not yet have a rating. At this time, there are no reviews or comments for this patent.

If you have personal experience with Multi-photon reactive compositions with inorganic particles..., we encourage you to share that experience with our LandOfFree.com community. Your opinion is very important and Multi-photon reactive compositions with inorganic particles... will most certainly appreciate the feedback.

Rate now

Comments { 0 }

Profile ID: LFUS-PAI-O-3738508