Radiation imagery chemistry: process – composition – or product th – Radiation modifying product or process of making – Radiation mask
Patent
1998-01-22
1999-11-16
Rosasco, S.
Radiation imagery chemistry: process, composition, or product th
Radiation modifying product or process of making
Radiation mask
430323, G03F 900
Patent
active
059854928
ABSTRACT:
A photomask and a method for using the photomask to make dimensionally controlled resist patterns are provided. A wafer having a resist coating thereon is exposed using the mask of the invention under specially controlled defocus conditions to provide the dimensionally controlled resist pattern profile. The mask which comprises multiple phase shifter means on one side of at least one of the light shielding patterns on the mask provides light passing through the mask having multiple phases on that side of the light shielding material which produces a dimensionally controlled resist pattern profile.
REFERENCES:
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patent: 5308722 (1994-05-01), Nistler
patent: 5368963 (1994-11-01), Hanyu et al.
patent: 5370975 (1994-12-01), Nakatani
patent: 5382484 (1995-01-01), Hosono
patent: 5443931 (1995-08-01), Watanabe
patent: 5543254 (1996-08-01), Kim et al.
patent: 5547789 (1996-08-01), Nakatani et al.
Mandelman Jack A.
Mih Rebecca D.
Wheeler Donald C.
International Business Machines - Corporation
Rosasco S.
Tomaszewski John J.
Townsend Tiffany L.
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