Multi-parameter process and control method

Details Multi-parameter process and control method Multi-parameter process and control method

2003-03-04

2009-11-17

Paschall, Mark H (Department: 3742)

Electric heating

Heating devices

With power supply and voltage or current regulation or...

C219S121430, C219S486000, C219S121400, C392S418000, C118S725000, C324S763010

Reexamination Certificate

active

07619184

ABSTRACT:
A method and system for generating control settings for a multi-parameter control system. The interdependencies of processing tools and the related effect on semiconductor wafers within a processing tool is factored into a mathematical model that considers desired and measured wafer quality parameters in the derivation of specific solutions of sets of possible quality parameter adjustments. A selection process determines a set of adjustments such as one that results in minimal changes to the process.

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