Multi mask method for selective mask feature enhancement

Details Multi mask method for selective mask feature enhancement Multi mask method for selective mask feature enhancement

1994-06-30

1996-10-08

Rosasco, S.

Radiation imagery chemistry: process, composition, or product th

Registration or layout process other than color proofing

430 5, 430394, 430311, 430312, G03F 900

Patent

active

055630120

ABSTRACT:
The preferred embodiment of the present invention is a method of enhancing normally unenhanced features types. Pattern shapes are placed on two or more relatively simple, modified masks instead of using a single mask containing diverse feature types. On these modified masks, (hereinafter "overlay masks"), all of the features are the type normally enhanced. A composite pattern is printed into photoresist through successive exposure to the overlay masks.

REFERENCES:
patent: 3890148 (1975-06-01), Lawson et al.
patent: 4374911 (1983-02-01), Hartley
patent: 4504558 (1985-03-01), Bohlen et al.
patent: 4774158 (1988-09-01), Vervoordeldonk et al.
patent: 5286584 (1994-02-01), Gemmick et al.
J. Garofalo, et al., "Mask Assisted Off-Axis Illumination Technique for Random Logic" J. Vac. Sci. Technology B, vol. 11, #6, pp. 2651-2658, Nov./Dec. 1993.

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