Multi-lens array of a wavefront sensor for reducing optical...

Optical: systems and elements – Single channel simultaneously to or from plural channels – By surface composed of lenticular elements

Reexamination Certificate

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C359S621000, C359S831000

Reexamination Certificate

active

06577447

ABSTRACT:

BACKGROUND OF THE INVENTION
1. Field of the Invention
This invention relates to a wavefront sensor for reducing optical interference. More particularly, this invention relates to a multi-lens array design of a wavefront sensor that can reduce optical interference. The optical interference occurs because each of a plurality of focal spots formed by the multi-lens array causes a rippling effect which propagates to and interferes with an accurate measurement of neighboring focal spots.
2. Description of the Related Art
Wavefront sensors have been used, for example, in camera focusing technology to measure the distance between an object and a camera by sending out a signal wavefront and to measure the round trip time of such signal wavefront. Knowing the distance, the camera can focus properly. Particularly, wavefront sensors include elements which provide information about phase distortions or aberrations in a received wavefront, and elements which analyze, measure, and provide information signals to correct for the aberrations received in optical wavefronts.
In the laser art, wavefront sensors, such as Shack-Hartman sensors, have been used to measure the phase front quality of an incoming laser beam. The wavefront of incoming beam is defined as a surface that is normal to the local propagation direction of the beam. Wave-aberration polynomial represents the departure of the actual wavefront from a perfect spherical reference surface.
FIG. 1
schematically illustrates a conventional Shack-Hartman sensor
100
including an array of lenses
140
, commonly referred to in the micro-optics technology as a multi-lens array (abbreviated to M.L.A.), to focus an incoming beam
120
to form a set of focal spots
150
(shown in
FIG. 2
) on a detector
130
, such as a charge coupled device (CCD) camera. Detector
130
detects focal spots
150
and transmits an output to a measuring unit (not shown). The measuring unit compares the light intensity of various focal spots
150
on detector
130
with a reference beam or with a set of nominal values. Based on the readings of the measuring unit, an adaptive optical system (not shown) then compensates for errors or deviations within the laser or resulting from the atmosphere through which the laser beam travels.
A multi-lens array
140
of conventional sensor
100
may be composed of a plurality of lenses, each having a square or rectangular aperture, arranged in a two-dimension configuration. As shown in
FIG. 2
, focal spots
150
are formed by multi-lens array
140
, each lens having a square configuration, such as illustrated by reference element
144
. The distribution of focal spots
150
creates a diffraction pattern spreading widely in both the x and y directions, a square array of 6×6 is shown, and are captured by CCD camera
130
. For each lens of multi-lens array
140
, a collection area of 9×9 CCD pixels or less, illustrated by reference element
132
, is assigned to capture the intensity of the central lobe of the corresponding focal spot
150
.
The conventional wavefront sensor
100
often encounters a cross talk problem, i.e., a measurement error in determining the characteristics of the plurality of focal spots.
FIGS. 3A and 3B
schematically show the cross talk problem. The error occurs because each focal spot
150
, for example, focal spot F
1
, radiates an energy, represented by a wave curve W
1
, that propagates to and directly interferes with the neighboring focal spots
150
, including, for example, focal spot F
2
, and vice versa, energy wave W
2
radiated by focal spot F
2
propagates and directly interferes with focal spot F
1
and other surrounding focal spots.
When multi-lens array
140
have a square or rectangular aperture configuration, such as schematically shown in
FIGS. 2 and 4
, focal spots F
1
and F
2
propagate energy waves W
1
and W
2
, respectively, orthogonally along the x and y axes. The rippling effect of energy wave W
2
along the x axis directly interferes with the measurement of intensity level of focal spot F
1
, and vice versa, the rippling effect of energy wave W
1
directly interferes with the measurement of intensity level of focal spot F
2
. It can be seen that the rippling effects of energy waves W
1
and W
2
along the y axis also directly interfere with other neighboring focal spots
150
.
In light of the foregoing, there is a need for a wavefront sensor which can eliminate or substantially reduce the cross talk problem. Also, the wavefront sensor needs to have a compact design and be insensitive to external disturbances. In addition, it is preferable that the wavefront sensor can be easily manufactured from a conventional lithography system to make the new detector and the multi-lens array.
SUMMARY OF THE INVENTION
The advantages and purposes of the invention will be set forth in part in the description which follows, and in part will be obvious from the description, or may be learned by practice of the invention. The advantages and purposes of the invention will be realized and attained by the elements and combinations particularly pointed out in the appended claims.
To attain the advantages and consistent with the principles of the invention, as embodied and broadly described herein, a first aspect of the invention is a method for reducing an optical interference in a wavefront sensor. The method comprises the steps of providing a multi-lens array in a two-dimension configuration to focus an incoming wavefront to form a plurality of focal spots, and systematically off-setting portions of the plurality of focal spots to create a staggered two-dimension diffraction pattern.
Another aspect of the present invention is a method for making a wavefront sensor to reduce an optical interference of focal spots. The method comprises the steps of providing a multi-lens array to focus an incoming wavefront to form a plurality of focal spots in a two-dimension configuration, and off-setting predetermined portions of the plurality of focal spots to form a staggered two-dimension diffraction pattern. The method also comprises the step of providing a detector to detect the staggered two-dimension diffraction pattern.
A further aspect of the present invention is a wavefront sensing apparatus, comprising a multi-lens array to focus an incoming wavefront to a plurality of focal spots, the multi-lens array configured to form a staggered two-dimension diffraction pattern to substantially eliminate optical interference, and a detector to detect the staggered two-dimension diffraction pattern.
Yet a further aspect of the present invention is a wavefront sensing apparatus having a multi-lens array to focus an incoming wavefront to form a plurality of focal spots, and a detector to detect the plurality of focal spots. The apparatus comprises a plurality of optical prisms attached to predetermined portions of the multi-lens array, so that corresponding predetermined portions of the plurality of focal spots are systematically off-set to form a staggered diffraction pattern on the detector.
It is to be understood that both the foregoing general description and the following detailed description are exemplary and explanatory only and are not restrictive of the invention as claimed. Additional advantages will be set forth in the description which follows, and in part will be understood from the description, or may be learned by practice of the invention. The advantages and purposes may be obtained by means of the combinations set forth in the attached claims.


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