Multi-layered complementary conductive line structure and...

Semiconductor device manufacturing: process – Making device or circuit emissive of nonelectrical signal – Including integrally formed optical element

Reexamination Certificate

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C257SE21561

Reexamination Certificate

active

11164022

ABSTRACT:
A multi-layered complementary conductive line structure, a manufacturing method thereof and a manufacturing method of a TFT (thin film transistor) display array are provided. The process of TFT having multi-layered complementary conductive line structures does not need to increase the mask number in comparison with the currently process and is able to solve the resistance problem of the lines inside a display.

REFERENCES:
patent: 4646424 (1987-03-01), Parks et al.
patent: 2005/0073619 (2005-04-01), Chen et al.

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