Semiconductor device manufacturing: process – Making device or circuit emissive of nonelectrical signal – Including integrally formed optical element
Reexamination Certificate
2007-11-27
2007-11-27
Booth, Richard A. (Department: 2812)
Semiconductor device manufacturing: process
Making device or circuit emissive of nonelectrical signal
Including integrally formed optical element
C257SE21561
Reexamination Certificate
active
11164022
ABSTRACT:
A multi-layered complementary conductive line structure, a manufacturing method thereof and a manufacturing method of a TFT (thin film transistor) display array are provided. The process of TFT having multi-layered complementary conductive line structures does not need to increase the mask number in comparison with the currently process and is able to solve the resistance problem of the lines inside a display.
REFERENCES:
patent: 4646424 (1987-03-01), Parks et al.
patent: 2005/0073619 (2005-04-01), Chen et al.
Chang Chi-Ming
Chen Chi-Lin
Chen Yu-Cheng
Booth Richard A.
Industrial Technology Research Institute
LandOfFree
Multi-layered complementary conductive line structure and... does not yet have a rating. At this time, there are no reviews or comments for this patent.
If you have personal experience with Multi-layered complementary conductive line structure and..., we encourage you to share that experience with our LandOfFree.com community. Your opinion is very important and Multi-layered complementary conductive line structure and... will most certainly appreciate the feedback.
Profile ID: LFUS-PAI-O-3876891