Multi-layer X-ray-reflecting mirrors with reduced internal stres

Details Multi-layer X-ray-reflecting mirrors with reduced internal stres Multi-layer X-ray-reflecting mirrors with reduced internal stres

1998-07-14

2000-12-12

Porta, David P.

X-ray or gamma ray systems or devices

Specific application

Diffraction, reflection, or scattering analysis

378 85, 378145, G21K 106

Patent

active

06160867&

ABSTRACT:
X-ray-reflecting mirrors are disclosed that exhibit reduced internal stress without any significant reduction in reflectance to X-rays. The mirrors comprise a substrate on a surface of which a multi-layer structure is formed. The multi-layer structure is formed by alternately and superposedly layering, on a surface of the substrate, a first material (e.g., molybdenum) and a second material (silicon with a dopant such as boron). Net internal stress of the multi-layer structure is controllably reduced by controlling the amount of diffused dopant in the second material.

REFERENCES:
patent: 4446194 (1984-05-01), Candelaria et al.
patent: 5188706 (1993-02-01), Hori et al.
patent: 5265143 (1993-11-01), Early et al.
patent: 5357899 (1994-10-01), Bassous et al.
patent: 5433988 (1995-07-01), Fukuda et al.
Hirayama et al., Appl. Phys. Lett. 52, 1335 (1998).

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