Multi-layer reflection mirror for soft X-ray to vacuum ultraviol

Details Multi-layer reflection mirror for soft X-ray to vacuum ultraviol Multi-layer reflection mirror for soft X-ray to vacuum ultraviol

1993-06-14

1994-05-10

Turner, A. A.

Stock material or miscellaneous articles

Composite

Of silicon containing

359584, 359585, 359588, 428469, 428472, 428698, 428699, 428701, 428702, 428704, 428913, G01K 106, B32B 1504

Patent

active

053106032

ABSTRACT:
A multi-layer reflection mirror for soft X-ray to vacuum ultraviolet ray, comprises a substrate, a plurality of first layers, and a plurality of second layers formed on the substrate alternately with the first layers. The first layer primarily consists of at least one of single elements, such as ruthenium or of a boride, carbide, silicide, nitride oxide of a transition metal. The second layer primarily consists of at least one of compounds of carbon, silicon (e.g. carbide, nitride and oxide of silicon), boron (e.g. carbide, nitride and oxide of boron), beryllium (e.g. carbide, nitride and oxide of beryllium) and aluminum (e.g. carbide, nitride and oxide of aluminum).

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patent: 4904542 (1990-02-01), Mroczkowski
Baumeister, P. and Arnon, O., "Use of Hafnium Dioxide in Multilayer Dielectric Reflectors for the Near UV", Applied Optics, vol. 16, No. 2, Feb. 1977.

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