Etching a substrate: processes – Forming or treating material useful in a capacitor
Reexamination Certificate
2005-01-11
2005-01-11
Mills, Gregory L. (Department: 1763)
Etching a substrate: processes
Forming or treating material useful in a capacitor
C029S025030
Reexamination Certificate
active
06841080
ABSTRACT:
A dielectric film is formed on a free-standing conductive metal layer to form a multi-layer foil comprising a conductive metal layer, a barrier layer and a dielectric oxide layer. Such multi-layer foils are mechanically flexible, and useful for the manufacture of capacitors. Examples of barrier layers include Ni—P or Ni—Cr alloys. After a second layer of conductive metal is deposited on a dielectric oxide surface opposing the first conductive metal layer, the resulting capacitor foil is processed into a capacitor. The resulting capacitor is a surface mounted capacitor or is formed as a integrated or embedded capacitor within a circuit board.
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Cheek Kevin
Dunn Gregory J.
Kingon Angus
Maria Jon-Paul
Savic Jovica
Culbert Roberts
Mills Gregory L.
Motorola Inc.
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