Multi-inlet PFS arc chamber for hi-current implanter

Details Multi-inlet PFS arc chamber for hi-current implanter Multi-inlet PFS arc chamber for hi-current implanter

2005-05-17

2005-05-17

Bueker, Richard (Department: 1763)

Radiant energy

Irradiation of objects or material

Ion or electron beam irradiation

C250S427000, C250S492210

Reexamination Certificate

active

06894296

ABSTRACT:
A multi-inlet arc chamber typically used in the emission of electrons from a plasma-forming gas in a plasma flood system. The chamber includes multiple gas inlet openings for flow of the gas into the chamber to increase turbulent flow of the gas in the chamber. Over time, the turbulent-flowing gas tends to contact various points rather than the same point or points on a filament in the chamber, as electrical current flows through the filament and electrons are emitted from the gas typically for the neutralization of positive charges on an ion-implanted semiconductor wafer substrate. Consequently, the filament is less susceptible to burnout and breakage and has an extended lifetime.

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