Electric lamp and discharge devices: systems – Discharge device load with fluent material supply to the... – Electron or ion source
Patent
1983-07-28
1985-12-03
Chatmon, Saxfield
Electric lamp and discharge devices: systems
Discharge device load with fluent material supply to the...
Electron or ion source
315 3, 250396R, 313436, 3133611, H01J 724, H05B 3126
Patent
active
045568235
ABSTRACT:
An apparatus capable of simultaneous focusing, positioning, and scanning of an ion beam is described. The apparatus uses metallic elements to form the sides of an open-ended substantially box-shaped structure. Application of AC and DC currents to the four corners of the structure create AC and DC fields within the structure that deflect an ion beam so as to perform the functions of positioning, focusing, and scanning. The center of focusing of the ion beam is placed closer to the center of scanning of the ion beam than in conventional ion beam deflection systems. As a result, the tendency of space charge beam blow-up during scanning is greatly diminished. By combining the functions of positioning, focusing, and scanning in one deflection element, the length of an ion beam deflection system is reduced, and the current capability is greatly increased.
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Keller John H.
Winnard James R.
Chatmon Saxfield
International Business Machines - Corporation
Jordan J.
Schecter Manny W.
Villella J.
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