X-ray or gamma ray systems or devices – Specific application – Diffraction – reflection – or scattering analysis
Reexamination Certificate
2007-12-07
2010-06-22
Ho, Allen C. (Department: 2882)
X-ray or gamma ray systems or devices
Specific application
Diffraction, reflection, or scattering analysis
C378S085000, C378S147000, C378S156000, C378S158000, C378S159000, C250S505100
Reexamination Certificate
active
07742566
ABSTRACT:
A multi-energy imaging system and method for selectively generating high-energy X-rays and low-energy X-ray beams are described. A pair of optic devices are used, one optic device being formed to emit high X-ray energies and the other optic device being formed to emit low X-ray energies. A selective filtering mechanism is used to filter the high X-ray energies from the low X-ray energies. The optic devices have at least a first solid phase layer having a first index of refraction with a first photon transmission property and a second solid phase layer having a second index of refraction with a second photon transmission property. The first and second layers are conformal to each other.
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Edic Peter Michael
Hopkins Forrest Frank
Lee Susanne Madeline
Asmus Scott J.
General Electric Company
Ho Allen C.
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