Multi-electron-beam pattern drawing apparatus

Details Multi-electron-beam pattern drawing apparatus Multi-electron-beam pattern drawing apparatus

1990-01-24

1990-12-04

Albritton, C. L.

Electric heating

Metal heating

By arc

2191213, 21912126, 21912128, 2504923, 2504922, 2504911, B23K 1500

Patent

active

049747363

ABSTRACT:
A multi-electron-beam pattern drawing apparatus having a plurality of electron beam sources and a plurality of electron beam sensors, provided on a common base member, is disclosed. The electron beam sources can be selectively driven for different uses, such as a pattern drawing (exposure) purpose and position detecting purpose, for example. In another aspect, the apparatus is provided with a function for correcting the pattern drawing magnification.

REFERENCES:
patent: 4584479 (1986-04-01), Lamattina et al.
patent: 4694178 (1987-09-01), Harte
patent: 4718019 (1988-01-01), Fillion et al.
patent: 4789945 (1988-12-01), Niijima
patent: 4810889 (1989-03-01), Yokomatsu et al.
Patent Abstracts of Japan, vol. 7, No. 36, Feb. 15, 1983, Kokai No. 57-187,849, May, 1981.
Patent Abstracts of Japan, vol. 8, No. 131, Jun. 19, 1984, Kokai No. 59-41,831, Mar., 1984.

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