Optical: systems and elements – Lens – With variable magnification
Reexamination Certificate
2005-03-01
2005-03-01
Ben, Loha (Department: 2873)
Optical: systems and elements
Lens
With variable magnification
C250S201200, C250S201300, C250S306000, C250S307000, C250S310000, C382S128000
Reexamination Certificate
active
06862142
ABSTRACT:
Techniques for utilizing a microscope inspection system capable of inspecting specimens at high throughput rates are described. The inspection system achieves the higher throughput rates by utilizing more than one detector array and a large field of view to scan the surface of the semiconductor wafers. The microscope inspection system also has high magnification capabilities, a high numerical aperture, and a large field of view. By using more than one detector array, more surface area of a wafer can be inspected during each scanning swath across the semiconductor wafers. The microscope inspection system is configured to have a larger field of view so that the multiple detector arrays can be properly utilized. Additionally, special arrangements of reflective and/or refractive surfaces are used in order to fit the detector arrays within the physical constraints of the inspection system.
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Ben Loha
Beyer Weaver & Thomas LLP
KLA-Tencor Technologies Corporation
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