X-ray or gamma ray systems or devices – Specific application – Diffraction – reflection – or scattering analysis
Patent
1989-12-22
1989-09-19
Fields, Carolyn E.
X-ray or gamma ray systems or devices
Specific application
Diffraction, reflection, or scattering analysis
378 88, 378 89, G01N 2100, G01F 100
Patent
active
048688568
ABSTRACT:
A method of measurement of mass flow rates of multicomponent systems comprises directing gamma radiation from a collimated source onto extended scattering means irradiating the flowing medium with single-scattered gamma photons, detecting scattered photons with wide angle photon energy detectors and computing the flow rates from the component velocities and densities.
REFERENCES:
patent: 4228353 (1980-10-01), Johnson
patent: 4282433 (1981-08-01), Loffel
patent: 4359638 (1982-11-01), Allport
Gay, Rodney, Ohkawa, Katsuhiro, Conference: Instrumentation in the Aerospace Industry, vol. 26, Advancesin Test Measurement, vol. 17, Proceedings of the 26th International Instrumentation Symposium, Seattle, WA (5-8, May 1980), pp. 253-260.
Frith Barry
Olatunbosun Adeboye
Fields Carolyn E.
Hynds Joseph A.
National Research Development Corporation
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