Multi-charged beam lens, charged-particle beam exposure...

Details Multi-charged beam lens, charged-particle beam exposure... Multi-charged beam lens, charged-particle beam exposure...

2005-09-20

2005-09-20

Lee, John D. (Department: 2874)

Radiant energy

With charged particle beam deflection or focussing

Magnetic lens

C250S398000

Reexamination Certificate

active

06946662

ABSTRACT:
There is provided a multi-charged beam lens constituted by stacking, via fiber chips serving as insulator members along the optical path of a charged beam, a plurality of electrodes having a charged beam passing region where a plurality of charged beam apertures are formed. The electrodes have shield apertures between the charged beam passing region and the fiber chips. A conductive shield extends through the shield apertures without contacting the electrodes, and cuts off a straight path which connects the charged beam passing region and the fiber chips serving as insulator members. This prevents the influence of charge-up of the insulator members on an electron beam in the multi-charged beam lens.

REFERENCES:
patent: 5291016 (1994-03-01), Taya
patent: 6617595 (2003-09-01), Okunuki
T. Sasaki,A Multibeam Scheme for Electron-Beam Lithography, J. Vac. Sci. Technol., 19(4), Nov./Dec. 1981, pp. 963-965.
K.Y. Lee et al.,High Aspect Ratio Aligned Multilayer Microstructure Fabrication, J. Vac. Sci, Technol. B 12(6), Nov./Dec. 1994, pp. 3425-3431.
A.D. Feinerman, et al.,Sub-centimeter Micromachined Electron Microscope, J. Vac. Sci. Technol. A 10(4), Jul./Aug. 1992, pp 611-616.

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